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Solvent Cleaning With the general elimination of the halogenated solvents, manufacturers have changed their flux and cleaning choices The new cleaning materials must be capable of dissolving the particular chemical residues from a given flux formulation Several detailed cleaning references are available11, 12, 13, 14, 15, 16 Solvent cleaning options17 have focused on semiaqueous cleaning, solvent defluxing using a blend of solvents, and vapor degreasing using a single or co-solvent mix Semiaqueous cleaning usually involves a two-step process where the assembly is first cleaned in the organic solvent, then rinsed in a separate stepTerpenes have been widely used as the solvent with dibasic esters and non-ionic surfactants added to improve cleaning and rinsing An alternative semiaqueous cleaning solvent is composed of high molecular alcohols The solvent is usually sprayed under immersion onto the assemblies in its pure form.

This step is followed by a rinse step that emulsifies the semiaqueous solvent and dissolves the ionic residues Innovations18 have shown that an aqueous emulsified solution of the solvent can also provide good cleaning Solvent cleaners may be inline or batch Inline cleaning usually involves spray under immersionThe temperature of the solvent wash tank is set below its flash point, and several rinse tanks follow the wash tank to ensure good cleaning before the final drying step Solvents such as glycol-ether blends are used for this process Batch degreasers may use n-propyl bromide in specialized applications Traditional batch cleaning was performed in a vapor degreaser that has a wash sump of boiling nonflammable azeotropic solvent and a rinse sump A vapor blanket forms above the sump and is contained using cooling coils at the mouth of the machine.

Fig 759: A Toshiba ultra-precision grinding machine [26]

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;call the subroutine to ;determine which switch is pressed. ;the subroutine returns the result ;in register r17 out PORTB, r17 ;output the value on PORTB rjmp loopit ;get more ; *********** ;GET_SWITCH: Subroutine to determine which switch is pressed. ;switch on return value in r17 ; PD0 0b11111110 ; PD1 0b11111101 ; PD2 0b11111011 ; PD3 0b11110111 ;registers destroyed: r18, r19 ;subroutines called: delay20ms ; *********** get_switch: in r18, PIND ;read PIND buffer andi r18, $0F ; cpi r18, $0F ;if no switch is pressed ;then loop back till pressed breq get_switch cpi r18, 0b00001110 ;check is SW0 is pressed brne not_0 ;if not check more its_0: rjmp next_step not_0: cpi r18, 0b00001101 ;check is SW1 is pressed brne not_1 ;if not check more its_1: rjmp next_step not_1: cpi r18, 0b00001011 ;check is SW2 is pressed brne not_2 ;if not check more its_2: rjmp next_step not_2: cpi r18, 0b00000111 ;check is SW3 is pressed brne get_switch ;if not some problem, so go back next_step: rcall delay20ms ;call a debounce delay routine waitfor_rel: ;now wait for the switch to be in r19, PIND ;be released andi r19, $0F ;when the switch is released, all cpi r19, $0F ;PIND0-3 bits will be 1 brne waitfor_rel rcall delay20ms ;OK, the switch is released ;debounce it mov r17, r18 ;put the switch code in r17 ori r17, $F0 ret ;and return

The assembly is first placed into the wash sump, and then is transferred to a rinse sump that contains clean solvent from the condensation at the cooling coils As the assembly is removed, it is held for a period in the vapor blanket for a final rinse and drying of the remaining solvent..

Co-solvent cleaning involves the use of a rinsing agent that is volatile and a solvating agent that is not volatile. The assembly is placed into the wash tank of boiling solvent where the solvating agent enhances the cleaning process. The vapor blanket above the wash sump contains only the rinsing agent. The assembly is moved from the wash sump into the rinse sump, which contains only the condensed rinsing agent. Finally, the assembly is removed from the rinse sump and held in the vapor blanket for a final rinse and drying step.

Aqueous Cleaning Aqueous defluxing is performed using a high pH saponifying solution that is diluted to a 10 to 25 percent aqueous solution. The saponifier may be organic or inorganic, with additives such as solvents and surfactants to improve wetting and cleaning. The organic cleaning agent usually contains an amine, such as monoethanol amine, whereas the inorganic cleaners use buffered metal salts such as NaOH/sodium carbonate/sodium bicarbonate. The wash step is usually done in an inline spray machine, followed by a de-ionized (DI) water rinse with several spray sections to remove the more contaminated material, then by a final rinse and a final blow-dry step. The cleaning agents in the saponifier react with the rosin or resin from the flux to form a soap in the same manner that the detergent used to wash greasy dishes reacts with the grease and helps it dissolve, or at least be emulsified and removed in the rinse water. Once the rosin or resin is removed, the rinse water solubilizes the ionic residues that were on the surface of the board as well as those trapped within the solid rosin matrix. Table 43.5 summarizes the possible cleaning agents for the various flux types.

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